The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2022
Filed:
Mar. 13, 2020
Applicant:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Inventors:
Nurcan Gecer Ulu, Sunnyvale, CA (US);
Svyatoslav Korneev, Stanford, CA (US);
Saigopal Nelaturi, Mountain View, CA (US);
Erva Ulu, Sunnyvale, CA (US);
Assignee:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/12 (2020.01); G06F 111/04 (2020.01); G06F 111/02 (2020.01); G06F 111/10 (2020.01);
U.S. Cl.
CPC ...
G06F 30/12 (2020.01); G06F 2111/02 (2020.01); G06F 2111/04 (2020.01); G06F 2111/10 (2020.01);
Abstract
A method for producing a design includes receiving a set of design constraints. A spatial field is created based on the design constraints. The spatial field is represented with a linear combination of one or more bases. A number of the one or more bases is less than a number of elements in the spatial field. Respective weights are optimized for each of the one or more bases. A design is produced based on the spatial field and the weights.