The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2022
Filed:
Jan. 16, 2019
Applicant:
Rasirc, Inc., San Diego, CA (US);
Inventors:
Jeffrey J. Spiegelman, San Diego, CA (US);
Zohreh Shamsi, San Diego, CA (US);
Assignee:
RASIRC, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 1/14 (2006.01); B01D 1/00 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
B01D 1/0082 (2013.01); B01D 1/14 (2013.01); C23C 16/448 (2013.01);
Abstract
Provided herein are methods, systems, and device for control, delivery, and purification of low vapor pressure gases in conjunction with carrier gas in micro-electronics and other critical process applications. The present invention is based on the observation that when temperature and pressure of a device for delivering a gas stream are held constant, the concentration of vapor in the gas stream may be modulated based on the level of liquid within the chamber thereof.