The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2022

Filed:

Jan. 21, 2021
Applicant:

American Sterilizer Company, Mentor, OH (US);

Inventors:

David Jesurun, South Euclid, OH (US);

Benjamin L. Yoder, Cleveland Heights, OH (US);

Assignee:

American Sterilizer Company, Mentor, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 90/30 (2016.01); F21V 5/00 (2018.01); F21V 5/04 (2006.01); F21V 14/06 (2006.01); F21V 23/00 (2015.01); A61B 90/00 (2016.01); H05B 45/00 (2022.01); A61B 90/35 (2016.01); F21W 131/205 (2006.01); H05B 47/00 (2020.01);
U.S. Cl.
CPC ...
A61B 90/30 (2016.02); A61B 90/00 (2016.02); F21V 5/008 (2013.01); F21V 5/04 (2013.01); F21V 14/06 (2013.01); F21V 23/003 (2013.01); H05B 45/00 (2020.01); A61B 90/35 (2016.02); A61B 2090/308 (2016.02); F21W 2131/205 (2013.01); H05B 47/00 (2020.01);
Abstract

A light head for a medical device support system. The light head includes first and second zones of light sources, an optical system, and a control system. The first and second zones of light sources emit respective first and second beams of light that form an illumination pattern having a pattern size at a region of interest. The optical system adjusts a beam spread of the second beam of light to change the pattern size of the illumination pattern from a first pattern size to a second pattern size. The control system varies power to the first and second zones of light sources in response to adjustment of the beam spread of the second beam of light to maintain a substantially constant magnitude of illuminance at the region of interest as the pattern size is changed from the first pattern size to the second pattern size.


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