The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2022
Filed:
Oct. 30, 2021
Applicant:
Elc Management Llc, Melville, NY (US);
Inventor:
Chad Garrison, San Pedro, CA (US);
Assignee:
ELC Management LLC, Melville, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A45D 34/04 (2006.01); A45D 40/26 (2006.01);
U.S. Cl.
CPC ...
A45D 34/046 (2013.01); A45D 34/043 (2013.01); A45D 34/045 (2013.01); A45D 40/264 (2013.01); A45D 40/265 (2013.01); A45D 40/267 (2013.01); A45D 2200/10 (2013.01);
Abstract
A rotating cosmetic applicator system features a unique rod/wiper relationship that causes the rod to rotate when it passes through the wiper. The applicator head rotates in one direction when the user inserts the applicator through the wiper, and in the opposite direction when the user removes the applicator through the wiper. The result is a more even loading of product onto the applicator head than with a conventional mascara system. A more even load of product on the brush will support a more consistent experience for the user.