The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Nov. 18, 2020
Applicant:

Bloom Energy Corporation, San Jose, CA (US);

Inventors:

Sanchit Khurana, Sunnyvale, CA (US);

Tad Armstrong, Burlingame, CA (US);

Harald Herchen, Los Altos, CA (US);

Emily Wong, Berkeley, CA (US);

Cheng-Yu Lin, Cupertino, CA (US);

Assignee:

BLOOM ENERGY CORPORATION, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 8/0202 (2016.01); H01M 8/12 (2016.01); H01M 4/04 (2006.01); H01M 8/021 (2016.01); H01M 8/0223 (2016.01); H01M 8/0228 (2016.01); H01M 4/86 (2006.01);
U.S. Cl.
CPC ...
H01M 8/0202 (2013.01); H01M 4/0471 (2013.01); H01M 8/021 (2013.01); H01M 8/0223 (2013.01); H01M 8/0228 (2013.01); H01M 8/12 (2013.01); H01M 2004/8684 (2013.01); H01M 2004/8689 (2013.01); H01M 2008/1293 (2013.01); Y02P 70/50 (2015.11);
Abstract

A method of making an interconnect for a solid oxide fuel cell stack includes contacting an interconnect powder located in a die cavity with iron, the interconnect powder including a chromium and iron, compressing the interconnect powder to form an interconnect having ribs and fuel channels on a first side of the interconnect, such that the iron is disposed on tips of the ribs; and sintering the interconnect, such that the iron forms an contact layer on the tips of the ribs having a higher iron concentration than a remainder of the interconnect. A glass containing cathode contact layer having a glass transition temperature of 900° C. or less may be located over the rib tips on the oxidant side of the interconnect.


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