The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Aug. 13, 2021
Applicants:

SK Hynix Inc., Gyeonggi-do, KR;

Jin Hong Ahn, Gyeonggi-do, KR;

Duality Inc., Daejeon, KR;

Inventor:

Jin Hong Ahn, Gyeonggi-do, KR;

Assignees:

Other;

SK hynix Inc., Gyeonggi-do, KR;

Duality Inc., Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/40 (2006.01); H01L 27/108 (2006.01); G11C 11/4093 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01); G11C 11/4096 (2006.01); G11C 11/406 (2006.01); H01L 21/02 (2006.01); H01L 21/28 (2006.01); G11C 11/404 (2006.01); H01L 29/08 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10802 (2013.01); G11C 11/404 (2013.01); G11C 11/4093 (2013.01); G11C 11/4096 (2013.01); G11C 11/40611 (2013.01); H01L 21/0262 (2013.01); H01L 21/02129 (2013.01); H01L 21/02236 (2013.01); H01L 21/28185 (2013.01); H01L 27/10844 (2013.01); H01L 29/0847 (2013.01); H01L 29/1037 (2013.01); H01L 29/7841 (2013.01); G11C 2211/4016 (2013.01); H01L 21/0217 (2013.01); H01L 21/02164 (2013.01); H01L 21/02255 (2013.01); H01L 29/42392 (2013.01);
Abstract

A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.


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