The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Apr. 02, 2020
Applicant:

Tectus Corporation, Saratoga, CA (US);

Inventors:

Ramin Mirjalili, San Jose, CA (US);

Joseph Czompo, San Jose, CA (US);

Thomas Llewellyn Owens, Saratoga, CA (US);

Michael West Wiemer, San Jose, CA (US);

Assignee:

Tectus Corporation, Saratoga, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02C 7/04 (2006.01); G06F 3/01 (2006.01); A61B 3/113 (2006.01);
U.S. Cl.
CPC ...
G02C 7/049 (2013.01); A61B 3/113 (2013.01); G02C 7/048 (2013.01); G06F 3/013 (2013.01); G02C 2200/02 (2013.01);
Abstract

An augmented reality system determines the position and orientation of an eye. The system includes an electronic contact lens that projects images onto a user's retina. The contact lens includes magnetic sensors. The magnetic sensors detect magnetic fields along one axis, or more than one axis, depending on their configuration. The sensors may be a conductive coil, a solenoid, or a tunneling magnetoresistance device. The sensors detect magnetic fields generated by magnetic sources. The magnetic sources may be collocated, or non-collocated, on a wearable device, a device in the environment, or a secondary electronic device. The sources may have different orientations such that they produce magnetic fields along different axes, and the sensors are configured to independently detect the magnetic fields. The system determines the pose of the eye using a combination of the measurements, and the position and orientation of the sensors and sources.


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