The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2022
Filed:
Apr. 10, 2018
Applicant:
Hamamatsu Photonics K.k., Hamamatsu, JP;
Inventor:
Naoya Matsumoto, Hamamatsu, JP;
Assignee:
HAMAMATSU PHOTONICS K.K., Hamamatsu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G01N 21/64 (2006.01); G02B 21/04 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0076 (2013.01); G01N 21/6458 (2013.01); G02B 21/0032 (2013.01); G02B 21/04 (2013.01); G02B 27/0068 (2013.01);
Abstract
A microscope apparatus includes SLMs each having a modulation plane, an objective lens disposed on an optical path between the modulation plane and an object, and a computer for controlling the SLMs on the basis of a modulation pattern including a correction pattern for correcting aberration caused by a refractive index interface of the object. The computer determines a position of the correction pattern in the modulation pattern on the basis of inclination information of the refractive index interface with respect to a plane perpendicular to an optical axis of the objective lens.