The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Jan. 26, 2021
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Katsumi Sasata, Kanagawa, JP;

Ryoji Goto, Kanagawa, JP;

Hiroshi Sato, Kanagawa, JP;

Yukito Saitoh, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3016 (2013.01);
Abstract

Provided are an optical element including a first optically-anisotropic layer consisting of a cured layer of a composition including a first liquid crystal compound, in which the first optically-anisotropic layer has 0.24 or more of a refractive index anisotropy Δnwhich is measured with light having a wavelength of 550 nm, the first optically-anisotropic layer has a first liquid crystal alignment pattern in which a direction of an optical axis derived from the first liquid crystal compound continuously changes rotationally in at least one in-plane direction, and in the first liquid crystal alignment pattern, in a case where a length Λ over which the direction of the optical axis rotates 180° in a plane is defined as a single period, the length Λ of the single period is 1.6 μm or less; a method for forming a photo-alignment pattern; and a method for manufacturing an optical element.


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