logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11453945 B1

PDFFull Text
Date of Patent:
Sep. 27, 2022

Filed:

Jun. 01, 2020

Gas supply apparatus

Applicant:

Toshiba Mitsubishi-electric Industrial Systems Corporation, Tokyo, JP;

Inventors:

Shinichi Nishimura, Tokyo, JP;

Kensuke Watanabe, Tokyo, JP;

Yoichiro Tabata, Tokyo, JP;

Assignee:

TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION, Tokyo, JP;

Attorney:

Xsensus LLP

Primary Examiner:

Rudy Zervigon

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); H01L 21/31 (2006.01); C23C 16/452 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4557 (2013.01); C23C 16/452 (2013.01); C23C 16/455 (2013.01); C23C 16/4583 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/45553 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32348 (2013.01); H01J 37/32449 (2013.01); H01L 21/31 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01);
Abstract

A gas ejector of a gas supply apparatus includes a nozzle portion. The opening of a first-stage restricting cylinder constituting the nozzle portion has a circular cross-sectional shape with a diameter r. A second-stage restricting cylinder is continuously formed with the first-stage restricting cylinder along a Z direction. The opening of the second-stage restricting cylinder has a circular cross-sectional shape with a diameter r, and supplies a source gas supplied from the first-stage restricting cylinder to a low-vacuum processing chamber below. At this time, the diameter ris set to satisfy 'r>r

Find Patent Forward Citations

Nishimura, Shinichi. (2022). Gas supply apparatus (U.S. Patent No. 11453945). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11453945

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…