The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2022
Filed:
Apr. 24, 2017
The Japan Steel Works, Ltd., Tokyo, JP;
Keisuke Washio, Kanagawa, JP;
Tatsuya Matsumoto, Kanagawa, JP;
THE JAPAN STEEL WORKS, LTD., Tokyo, JP;
Abstract
An atomic layer deposition apparatus includes a film-forming containerin which a film-forming process is performed, a vertically movable stageconfigured to hold a substrate, a susceptorheld on the stageand being configured to hold the substrate, and a stage stopperconfigured to stop rising of the stageand, when in contact with the susceptor, partitioning a film-forming space S in which the film-forming process is performed and a transporting space in which transport of the substrateis performed. Further, the susceptorincludes an upper susceptor substrate holding portionB configured to hold the substrate, and an upper susceptor peripheral portionA arranged in a periphery of the upper susceptor substrate holding portionB, wherein a susceptor deposition prevention memberis provided on the upper susceptor peripheral portionA.