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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11453940 B1

PDFFull Text
Date of Patent:
Sep. 27, 2022

Filed:

Sep. 04, 2020

Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition

Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventors:

Sumika Tamura, Tokyo, JP;

Mikio Shinno, Tokyo, JP;

Daisei Fujito, Tokyo, JP;

Kiyoaki Nishitsuji, Tokyo, JP;

Takehiro Nishi, Tokyo, JP;

Naoko Mikami, Tokyo, JP;

Assignee:

TOPPAN PRINTING CO., LTD., Tokyo, JP;

Attorney:

Squire Patton Boggs (US) LLP

Primary Examiner:

Nathan L Van Sell

Int. Cl.
CPC ...
C23C 14/04 (2006.01); C25D 1/04 (2006.01); C25B 11/055 (2021.01); C25C 1/08 (2006.01); C25C 7/08 (2006.01); C25D 1/10 (2006.01); C25D 11/34 (2006.01); H01L 51/00 (2006.01); C25D 3/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C25B 11/055 (2021.01); C25C 1/08 (2013.01); C25C 7/08 (2013.01); C25D 1/04 (2013.01); C25D 1/10 (2013.01); C25D 11/34 (2013.01); C25D 3/562 (2013.01); H01L 51/0011 (2013.01);
Abstract

A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.

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Tamura, Sumika. (2022). Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition (U.S. Patent No. 11453940). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11453940

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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