The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Mar. 30, 2020
Applicant:

Nippon Chemical Industrial Co., Ltd., Tokyo, JP;

Inventors:

Ken Tamura, Tokyo, JP;

Yuki Sawatsugawa, Tokyo, JP;

Natsuhiro Sano, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 9/50 (2006.01);
U.S. Cl.
CPC ...
C07F 9/50 (2013.01);
Abstract

A production method by which a biarylphosphine useful as a Buchwald phosphine ligand can be obtained in high purity is provided through an industrially advantageous process. The production method of a biarylphosphine comprises a step A of reacting a lithiated product obtained through lithiation of a halogenated benzene derivative with a benzene derivative to obtain a biphenyl derivative, and a step B of the reacting the biphenyl derivative with a halogenated phosphine. In the step A, the charge molar ratio of the halogenated benzene derivative to the benzene derivative is preferably 1.0 to 5.0.


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