The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Apr. 25, 2019
Applicant:

Skc Co., Ltd., Gyeonggi-do, KR;

Inventors:

Seung Mo Hong, Incheon, KR;

Hyeon Myeong Seo, Ulsan, KR;

Junghwan Shin, Gyeonggi-do, KR;

Jeongmoo Kim, Gyeonggi-do, KR;

Assignee:

SKC CO., LTD., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 319/28 (2006.01); C07C 319/08 (2006.01); C07C 319/20 (2006.01); C07D 339/08 (2006.01); C07C 321/04 (2006.01);
U.S. Cl.
CPC ...
C07C 319/28 (2013.01); C07C 319/08 (2013.01); C07C 319/20 (2013.01); C07D 339/08 (2013.01); C07C 321/04 (2013.01);
Abstract

According to one embodiment, in producing polythiols in a manner similar to a conventional method, a polythiol having improved storage stability may be produced in a convenient manner by adjusting reaction conditions so as to prevent thiourea from remaining within products. In particular, the equivalent weight of thiourea to be used in a reaction may be adjusted to a predetermined range, thereby reducing the amount of unreacted thiourea, and thiourea may be removed once more in a sub sequent process, thereby effectively removing remaining thiourea while achieving a high yield. The polythiol thus produced does not contain residual thiourea, and thus does not show discoloration or cloudiness caused by precipitates even under prolonged storage or high-temperature conditions.


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