The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Apr. 29, 2019
Applicant:

Global Graphene Group, Inc., Dayton, OH (US);

Inventors:

Yi-jun Lin, Taoyuan, TW;

Bor Z. Jang, Centerville, OH (US);

Assignee:

Global Graphene Group, Inc., Dayton, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F28D 15/00 (2006.01); C01B 32/184 (2017.01); C01B 32/198 (2017.01); C01B 32/225 (2017.01); H04B 1/04 (2006.01); H04B 1/08 (2006.01); C01B 32/23 (2017.01); H05K 7/20 (2006.01); F28D 15/04 (2006.01);
U.S. Cl.
CPC ...
C01B 32/184 (2017.08); C01B 32/198 (2017.08); C01B 32/225 (2017.08); C01B 32/23 (2017.08); F28D 15/046 (2013.01); H04B 1/04 (2013.01); H04B 1/08 (2013.01); H05K 7/20336 (2013.01); C01B 2204/04 (2013.01); C01B 2204/24 (2013.01);
Abstract

Provided is a vapor-based heat transfer apparatus (e.g. a vapor chamber or a heat pipe), comprising: a hollow structure having a hollow chamber enclosed inside a sealed envelope or container made of a thermally conductive material, a wick structure in contact with one or a plurality of walls of the hollow structure, and a working liquid within the hollow structure and in contact with the wick structure, wherein the wick structure comprises a graphene material and the hollow structure walls comprise an evaporator wall having a first surface plane and a condenser wall having a second surface plane, wherein multiple sheets of the graphene material in the wick structure are aligned to be substantially parallel to one another and perpendicular to at least one of the first surface plane and the second surface plane. Also provided is a process for producing this apparatus.


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