The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Oct. 21, 2019
Applicant:

Board of Regents, the University of Texas System, Austin, TX (US);

Inventors:

Behnoush Dousti, Richardson, TX (US);

Gil Sik Lee, Richardson, TX (US);

Negar Geramifard, Richardson, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/168 (2017.01); C01B 32/162 (2017.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C01B 32/168 (2017.08); C01B 32/162 (2017.08); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

Effective techniques for patterning carbon nanotube (CNT) sheets are disclosed herein. A carbon nanotube forest is grown on a catalyst-incorporated substrate, CNT sheets are drawn from the carbon nanotube forest, the CNT sheets are stacked on a substrate, followed by etching the CNT sheets by using a shadow mask through a controlled etch process. In some implementations, etching of the CNT sheets is carried out in a capacitively coupled plasma (CCP) etching system, where the CNT sheets are selectively exposed, in a controlled environment, to oxygen plasma via the shadow mask.


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