The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2022

Filed:

Aug. 09, 2019
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Kyle L. Grosse, Elk Grove Village, IL (US);

Gary A. Frazier, Garland, TX (US);

Catherine Trent, Allen, TX (US);

Ralph Korenstein, Natick, MA (US);

Assignee:

RAYTHEON COMPANY, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 15/02 (2006.01); H03H 7/01 (2006.01); H03H 9/24 (2006.01);
U.S. Cl.
CPC ...
H04B 15/02 (2013.01); H03H 7/0161 (2013.01); H03H 9/24 (2013.01); H03H 2007/013 (2013.01); H03H 2210/02 (2013.01);
Abstract

A dynamic aperture is disclosed. A dynamic aperture includes a base layer, a conductive structure disposed on the base layer, and a layer of a material having a dynamically controllable electrical conductivity that is disposed over the base layer and the conductive structure. A transmission profile of the dynamic aperture is determined by a combination of the conductive structure and the layer of the material. The transmission profile is dynamically alterable by controlling the electrical conductivity of the layer of the material.


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