The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Aug. 05, 2020
Honeywell International Inc., Morris Plains, NJ (US);
Marc D. Ruggiero, Spokane Valley, WA (US);
Stephane Ferrasse, Spokane, WA (US);
Frank C. Alford, Spokane Valley, WA (US);
Susan D. Strothers, Mead, WA (US);
Patrick K. Underwood, Spokane, WA (US);
Honeywell International Inc., Charlotte, NC (US);
Abstract
The present disclosure relates generally to a planar sputtering target. In particular, the present disclosure provides a planar sputtering target comprising a planar sputtering surface and a back surface opposite the planar sputtering surface. The planar sputtering target is formed from a 2N purity tin having an average grain size from at least 10 mm to at most 100 mm. The present disclosure provides a method of manufacturing the tin planar sputtering target having an average grain size from at least 10 mm to at most 100 mm.