The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2022

Filed:

Mar. 30, 2020
Applicant:

Futuretech Capital, Inc., Palo Alto, CA (US);

Inventors:

Robert Petcavich, The Woodlands, TX (US);

Michael Morrione, Jackson, CA (US);

Robert Routh, Latham, NY (US);

Assignee:

FUTURETECH CAPITAL, INC., Palo Alto, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G06F 3/041 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06F 3/041 (2013.01); G03F 7/26 (2013.01); G03F 7/70 (2013.01); G06F 2203/04103 (2013.01);
Abstract

Light reflection from a metal mesh touch sensor is reduced or prevented by encasing the metal lines with a passivation coating and including non-reflective nanoparticles in the patterning photoresist. The photoresist is mixed with catalytic nanoparticles wherein the nanoparticles are formed to minimize light reflection. The nanoparticles may be carbon coated metallic particles, or uncoated palladium nanoparticles. Also, a standoff photoresist layer may be included between the substrate and the photoresist composition to prevent reflection from the edges of the metallic lines.


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