The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2022

Filed:

Sep. 03, 2019
Applicant:

Singapore University of Technology and Design, Singapore, SG;

Inventors:

Shao Ying Huang, Singapore, SG;

Zhi Hua Ren, Singapore, SG;

Wen Chuan Mu, Singapore, SG;

Jia Gong, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/383 (2006.01); H01F 41/02 (2006.01);
U.S. Cl.
CPC ...
G01R 33/383 (2013.01); H01F 41/0253 (2013.01);
Abstract

There is provided a method of forming a permanent magnet system, the method including: determining one or more types of geometrical parameters for forming an array of magnet ring pairs including a first subarray of first magnet rings and a second subarray of second magnet rings spaced apart from the first subarray of the first magnet rings along a longitudinal axis; and forming the array of magnet ring pairs based on the determined one or more types of geometrical parameters, whereby the above-mentioned determining one or more types of geometrical parameters for forming the array of magnet ring pairs is based on a genetic algorithm. There is also provided a corresponding permanent magnet system, such as formed by the method.


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