The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Jan. 15, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Tatsuya Arakawa, Saitama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an imprint method of forming a pattern on an imprint material on a substrate using a mold, comprising: performing preliminary curing of irradiating the imprint material with light to cure the imprint material to a first target hardness; and performing main curing of irradiating the imprint material with curing light to cure the imprint material to a second target hardness, wherein the preliminary curing includes a first process of irradiating the imprint material with first light to which the imprint material has first reaction sensitivity, and a second process of irradiating the imprint material with second light to which the imprint material has second reaction sensitivity lower than the first reaction sensitivity, and is controlled such that an end timing of the second process is later than an end timing of the first process.