The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Oct. 12, 2020
Applicant:
University of Louisville Research Foundation, Inc., Louisville, KY (US);
Inventors:
Mahendra K. Sunkara, Louisville, KY (US);
Daniel F. Jaramillo-Cabanzo, Louisville, KY (US);
Sonia J. Calero-Barney, Louisville, KY (US);
Assignee:
University of Louisville Research Foundation, Inc., Louisville, KY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 19/00 (2006.01); C30B 19/10 (2006.01); C30B 29/40 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C30B 19/106 (2013.01); C30B 29/406 (2013.01); H01L 21/0254 (2013.01); H01L 21/02625 (2013.01);
Abstract
Provided herein are methods of performing liquid phase epitaxy (LPE) of III-V compounds and alloys at low pressures using pulsed nitrogen plasma to form an epitaxial layer e.g. on a substrate. The pulse sequence of plasma (with on and off time scales) enables LPE but avoids crust formation on top of molten metal. The concentration of nitrogen inside the molten metal is controlled to limit spontaneous nucleation.