The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Dec. 22, 2017
SK Global Chemical Co., Ltd., Seoul, KR;
Christian Laurichesse, Lons, FR;
Thibaut Severac, Villeurbanne, FR;
Angélique Lelievre, Bambiderstroff, FR;
Claire Isabelle Michalowicz, Evreux, FR;
Louis Defoor, Lons, FR;
Yves Cabon, Metz, FR;
SK GLOBAL CHEMICAL CO., LTD., Seoul, KR;
Abstract
A method of stabilizing radical ethylene copolymerization reactions for approximately 5 to 10 minutes, the method including using a phenolic compound with other comonomers and performing the radical ethylene copolymerization reactions at high pressure. Also, a method of preparing an ethylene copolymer at high pressure in the presence of one or more phenolic compounds, as defined below, and one or more initiators.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile