The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Jun. 10, 2016
Applicant:

The Regents of the University of Michigan, Ann Arbor, MI (US);

Inventors:

Gergely Lautner, Ann Arbor, MI (US);

Steven P. Schwendeman, Ann Arbor, MI (US);

Mark E. Meyerhoff, Ann Arbor, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 31/19 (2006.01); A61K 47/36 (2006.01); A61K 9/00 (2006.01); A61K 9/06 (2006.01); A61L 15/28 (2006.01); A61L 15/52 (2006.01); A61K 9/16 (2006.01);
U.S. Cl.
CPC ...
A61K 31/19 (2013.01); A61K 9/0014 (2013.01); A61K 9/0024 (2013.01); A61K 9/06 (2013.01); A61K 9/1647 (2013.01); A61K 47/36 (2013.01); A61L 15/28 (2013.01); A61L 15/52 (2013.01); A61L 2300/114 (2013.01);
Abstract

A polymeric composition includes poly(lactide-co-glycolide) (PLGA) microspheres; and at least one of a discrete RSNO adduct or a polymeric RSNO encapsulated within the microspheres, with the at least one of the discrete RSNO adduct or the polymeric RSNO adduct capable of releasing nitric oxide (NO). The polymeric composition exhibits stability under dry conditions at 37° C. and prolonged and controllable NO release rates, when exposed to light capable of photolyzing an RSNO bond, or when exposed to moisture, for a predetermined amount of time from the at least one of the discrete RSNO adduct or the polymeric RSNO adduct.


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