The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Nov. 19, 2018
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Pohling Then, Kyoto, JP;

Kenji Kobayashi, Kyoto, JP;

Sadamu Fujii, Kyoto, JP;

Taiki Hinode, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/3105 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02065 (2013.01); H01L 21/31053 (2013.01); H01L 21/67051 (2013.01); H01L 21/67115 (2013.01); H01L 21/67207 (2013.01); H01L 21/67167 (2013.01);
Abstract

A substrate processing method and a substrate processing apparatus are provided, which solve problems of pattern collapse and particles. The substrate processing method includes: a surface modification step of modifying a surface of a substrate having an oxide thereon to improve or reduce roughness of the surface; a surface cleaning step of supplying a treatment liquid to the modified surface of the substrate to clean the surface of the substrate with the treatment liquid; and a hydrophobization step of supplying a hydrophobizing agent to the cleaned surface of the substrate to hydrophobize the surface of the substrate.


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