The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Sep. 14, 2020
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Richard C. Lanza, Brookline, MA (US);

Berthold Klaus Paul Horn, Chatham, NH (US);

Akintunde I. Akinwande, Newton, MA (US);

George Barbastathis, Boston, MA (US);

Rajiv Gupta, Boston, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/24 (2006.01); H01J 37/256 (2006.01); G01N 23/22 (2018.01); G01N 23/04 (2018.01); H01J 37/244 (2006.01); G01N 23/2252 (2018.01); G01N 23/044 (2018.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G01N 23/044 (2018.02); G01N 23/2252 (2013.01); H01J 37/244 (2013.01); H01J 37/256 (2013.01); H01J 2237/2004 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/2807 (2013.01);
Abstract

System and method for nanoscale X-ray imaging. The imaging system comprises an electron source configured to generate an electron beam along a first direction; an X-ray source comprising a thin film anode configured to receive the electron beam at an electron beam spot on the thin film anode, and to emit an X-ray beam substantially along the first direction from a portion of the thin film anode proximate the electron beam spot, such that the X-ray beam passes through the sample specimen. The imaging apparatus further comprises an X-ray detector configured to receive the X-ray beam that passes through the sample specimen. Some embodiments are directed to an electron source that is an electron column of a scanning electron microscope (SEM) and is configured to focus the electron beam at the electron beam spot.


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