The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2022
Filed:
Mar. 04, 2019
Tasmit, Inc., Yokohama, JP;
Masahiro Oya, Yokohama, JP;
TASMIT, INC., Yokohama, JP;
Abstract
The present invention relates to a pattern edge detection method applicable to a semiconductor inspection apparatus that performs a pattern inspection using pattern design data. This method includes: generating an image of a pattern; detecting an edge of the pattern on the image based on a reference pattern generated from design data for the pattern; repeating generating of an image of a pattern and detecting of an edge of the pattern on the image to produce training-data candidates including a plurality of images and corresponding pattern edges; determining training data by removing pattern edges and corresponding images from the training-data candidates, the pattern edges to be removed being pattern edges satisfying a predetermined disqualification condition; producing an edge detection model by machine learning using the training data; generating an image of other pattern; and detecting an edge of the other pattern on the image using the edge detection model.