The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2022
Filed:
Jul. 04, 2018
SK Innovation Co., Ltd., Seoul, KR;
SK Global Chemical Co., Ltd., Seoul, KR;
Minho Jung, Daejeon, KR;
Cheolwoo Kim, Daejeon, KR;
Jinsu Ham, Daejeon, KR;
Sunjoo Kim, Daejeon, KR;
Myung Jun Park, Daejeon, KR;
Namkyu Lee, Daejeon, KR;
Hyesoo Lee, Daejeon, KR;
SK Innovation Co., Ltd., Seoul, KR;
SK Global Chemical Co., Ltd., Seoul, KR;
Abstract
Provided are a polymer for an organic bottom anti-reflective coating and a bottom anti-reflective coating composition containing the same. More specifically, provided are a polymer for an organic bottom anti-reflective coating capable of relieving reflection of exposure light and irradiation light on a substrate of a photoresist layer applied on the substrate in a lithographic process of manufacturing a semiconductor device, and a bottom anti-reflective coating composition containing the same.