The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Nov. 30, 2020
Applicant:

T.o.s Co., Ltd., Osan-si, KR;

Inventors:

Bum Ho Choi, Goyang-si, KR;

Seung Soo Lee, Suwon-si, KR;

Yeong Geun Jo, Osan-si, KR;

Yong Sik Kim, Suwon-si, KR;

Assignee:

T.O.S Co., Ltd., Gyeonggi-do, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C30B 35/00 (2006.01); C30B 23/08 (2006.01); C23C 14/08 (2006.01); C23C 14/30 (2006.01);
U.S. Cl.
CPC ...
C30B 35/00 (2013.01); C23C 14/086 (2013.01); C23C 14/30 (2013.01); C30B 23/08 (2013.01);
Abstract

Disclosed herein is an apparatus for growing a single crystal metal-oxide epi wafer, including a reaction chamber having an internal space, a substrate mounting unit disposed in the internal space and allowing a substrate to be mounted thereon, a metal-oxide treating unit treating a metal-oxide to supply metal ions and oxygen ions generated from the metal-oxide to the substrate, and an arsenic supply unit installed to face the substrate and supplying arsenic ions to the substrate, wherein the metal-oxide treating unit includes a mount disposed to face the substrate in the internal space and allowing a zinc oxide plate which is the metal-oxide to be installed thereon, and an electron beam irradiator irradiating the zinc oxide plate with an electron beam in a direct manner to cause zinc ions and oxygen ions evaporated from the zinc oxide plate to move toward the substrate.


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