The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

May. 01, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Tuan Anh Nguyen, San Jose, CA (US);

Jason M. Schaller, Austin, TX (US);

Edward P. Hammond, IV, Hillsborough, CA (US);

David Blahnik, Round Rock, TX (US);

Tejas Ulavi, San Jose, CA (US);

Amit Kumar Bansal, Milpitas, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Jun Ma, Milpitas, CA (US);

Juan Carlos Rocha, San Carlos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/505 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/505 (2013.01); C23C 16/4404 (2013.01); C23C 16/4581 (2013.01);
Abstract

Embodiments described herein relate to ground path systems providing a shorter and symmetrical path for radio frequency (RF) energy to propagate to a ground to reduce generation of the parasitic plasma. The ground path system bifurcates the processing volume of the chamber to form an inner volume that isolates an outer volume of the processing volume.


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