The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Jun. 25, 2021
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Daigo Aoki, Tokyo, JP;

Chikao Ikenaga, Tokyo, JP;

Isao Inoue, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01); B05C 21/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B05C 21/005 (2013.01); C23C 14/24 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01);
Abstract

A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.


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