The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Jan. 11, 2017
Applicant:

President and Fellows of Harvard College, Cambridge, MA (US);

Inventors:

Christopher David Hinojosa, Cambridge, MA (US);

Josiah Sliz, Boston, MA (US);

Daniel Levner, Cambridge, MA (US);

Guy Thompson, Lexington, MA (US);

Hubert Geisler, Saint-die-des-Vosges, FR;

Jose Fernandez-Alcon, Cambridge, MA (US);

Donald E. Ingber, Boston, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12M 3/06 (2006.01); B01L 3/00 (2006.01); B82Y 15/00 (2011.01); C12M 1/34 (2006.01); G01N 33/50 (2006.01); C12M 3/00 (2006.01); C12M 1/26 (2006.01);
U.S. Cl.
CPC ...
C12M 23/16 (2013.01); B01L 3/5027 (2013.01); B01L 3/50273 (2013.01); B01L 3/502715 (2013.01); B01L 3/502746 (2013.01); B82Y 15/00 (2013.01); C12M 21/08 (2013.01); C12M 33/12 (2013.01); C12M 41/00 (2013.01); C12M 41/40 (2013.01); C12M 41/46 (2013.01); G01N 33/5005 (2013.01); B01L 2200/027 (2013.01); B01L 2200/0605 (2013.01); B01L 2200/0684 (2013.01); B01L 2300/044 (2013.01); B01L 2300/0681 (2013.01); B01L 2300/0816 (2013.01); B01L 2300/0864 (2013.01); B01L 2300/0867 (2013.01); B01L 2300/14 (2013.01); B01L 2400/0487 (2013.01); B01L 2400/084 (2013.01);
Abstract

Systems and methods for improved flow properties in fluidic and microfluidic systems are disclosed. The system includes a microfluidic device having a first microchannel, a fluid reservoir having a working fluid and a pressurized gas, a pump in communication with the fluid reservoir to maintain a desired pressure of the pressurized gas, and a fluid-resistance element located within a fluid path between the fluid reservoir and the first microchannel. The fluid-resistance element includes a first fluidic resistance that is substantially larger than a second fluidic resistance associated with the first microchannel.


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