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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11434336 B1

PDFFull Text
Date of Patent:
Sep. 06, 2022

Filed:

Oct. 01, 2021

Composition and method for manufacturing a film comprising thiourethane layer

Applicant:

Skc Co., Ltd., Suwon-si, KR;

Inventors:

Sang Mook Kim, Suwon-si, KR;

Sungjin Chung, Suwon-si, KR;

Haksoo Lee, Suwon-si, KR;

Assignee:

SKC Co., Ltd., Suwon-si, KR;

Attorney:

NSIP Law

Primary Examiner:

Tae H Yoon

Int. Cl.
CPC ...
C08J 5/18 (2006.01); C08G 18/24 (2006.01); C08G 18/75 (2006.01); C08G 18/73 (2006.01); C08G 18/38 (2006.01); C08G 18/48 (2006.01); C08K 5/134 (2006.01); B32B 27/40 (2006.01); B32B 27/30 (2006.01); B32B 27/08 (2006.01); B32B 27/22 (2006.01); B32B 37/18 (2006.01); B32B 3/26 (2006.01); B32B 17/10 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); B32B 3/263 (2013.01); B32B 17/10005 (2021.01); B32B 17/10036 (2013.01); B32B 17/1077 (2013.01); B32B 17/10761 (2013.01); B32B 27/08 (2013.01); B32B 27/22 (2013.01); B32B 27/30 (2013.01); B32B 27/40 (2013.01); B32B 37/185 (2013.01); C08G 18/246 (2013.01); C08G 18/3876 (2013.01); C08G 18/4833 (2013.01); C08G 18/73 (2013.01); C08G 18/758 (2013.01); C08K 5/134 (2013.01); B32B 2307/418 (2013.01); B32B 2307/54 (2013.01); B32B 2329/06 (2013.01); B32B 2375/00 (2013.01); B32B 2605/006 (2013.01); B32B 2605/08 (2013.01); C08J 2331/02 (2013.01); C08J 2375/04 (2013.01);
Abstract

A film for glass bonding includes a thiourethane layer comprising a heterocyclo-alkanediyl-based repeat unit indicated by Formula 1, and a linear alkanediyl-based repeat unit indicated by Formula 2, and a base layer, disposed on a surface of the thiourethane layer, comprising a polyvinyl acetal resin and a plasticizer. In the Formula 1, R1 is —O— or —S—, and X is a heterocyclo-alkanediyl group having carbon atoms of 3 to 10 and sulfur atoms of 1 to 5, and in the Formula 2, R2 is —O— or —S—, and n2 is an integer of 4 to 10.

Find Patent Forward Citations

Kim, Sang. (2022). Composition and method for manufacturing a film comprising thiourethane layer (U.S. Patent No. 11434336). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11434336

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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