The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Sep. 04, 2020
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Hisashi Namba, Utsunomiya, JP;

Noriyasu Hasegawa, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/227 (2017.01); B29C 64/112 (2017.01); B29C 64/209 (2017.01); B41J 2/045 (2006.01); B41J 3/54 (2006.01); G03F 7/00 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
B29C 64/227 (2017.08); B29C 64/112 (2017.08); B29C 64/209 (2017.08); B41J 2/04573 (2013.01); B41J 2/04581 (2013.01); B41J 3/543 (2013.01); G03F 7/0002 (2013.01); B29L 2031/34 (2013.01);
Abstract

An imprint apparatus includes: a substrate stage configured to move a substrate; an ejection unit including a plurality of nozzles and configured to eject an ejection material from the nozzles onto the substrate in synchronization with movement of the substrate stage; and a mold driving mechanism configured to drive a mold on which a pattern is formed to press down the mold onto the substrate. The imprint apparatus determines a relative ejection timing of an abnormal nozzle with respect to a normal nozzle based on ejection properties of the nozzles and a moving direction of the substrate stage, determines an ejection timing of the normal nozzle based on the determined relative ejection timing, and controls a synchronization timing of the substrate stage and the ejection unit based on the determined ejection timing of the normal nozzle.


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