The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2022

Filed:

Jul. 22, 2016
Applicant:

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Hideo Takei, Osaka, JP;

Susumu Sakio, Osaka, JP;

Katsuhiko Kishimoto, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/362 (2014.01); H01L 51/00 (2006.01); B23K 26/38 (2014.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
B23K 26/362 (2013.01); B23K 26/38 (2013.01); C23C 14/042 (2013.01); C23C 14/048 (2013.01); H01L 51/0011 (2013.01);
Abstract

A deposition mask in which a resin film can be completely removed in opening portions, a method of manufacturing the deposition mask, and a mask member for the deposition mask are provided. A light irradiation source for laser light is disposed on one side of a resin film () and emits the laser light for forming a pattern of opening portions. A reflective film () is provided on another side of the resin film () and reflects light having a wavelength of the laser light emitted from the light irradiation source for the laser light. The laser light reflected by the reflective film () is used to form the patterns of the opening portion () in the resin film ().


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