The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2022
Filed:
Jun. 09, 2016
Biedermann Technologies Gmbh & Co. KG, Donaueschingen, DE;
Lutz Biedermann, VS-Villingen, DE;
Timo Biedermann, Trossingen, DE;
Achim Zipse, Baden-Baden, DE;
Gael Dreher, Karlsruhe, DE;
BIEDERMANN TECHNOLOGIES GMBH & CO. KG, Donaueschingen, DE;
Abstract
An intervertebral implant includes: a body with an upper wall configured to engage a first vertebral end plate and a lower wall configured to engage a second vertebral end plate, and a load transmitting part configured to transmit load between the upper wall and the lower wall; and the load transmitting part is configured to assume a compressed condition in which a distance between the upper wall and the lower wall defines a first height of the implant and an expanded condition in which the distance between the upper wall and the lower wall defines a second height of the implant that is greater than the first height; and the load transmitting part is attached to the upper wall at at least two first connecting locations and is attached to the lower wall at at least two second connecting locations and has substantially an X-shape in a front view of the implant; and the implant is made of a material that exhibits shape memory properties that permit the implant to remain in the compressed condition without outside forces acting upon it and to change to the expanded condition in response to a temperature being directed to a recovery level.