The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Mar. 19, 2021
Applicant:

Osram Opto Semiconductors Gmbh, Regensburg, DE;

Inventors:

Werner Bergbauer, Windberg, DE;

Thomas Lehnhardt, Regensburg, DE;

Jürgen Off, Regensburg, DE;

Joachim Hertkorn, Woerth an der Donau, DE;

Assignee:

OSRAM OLED GMBH, Regensburg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 33/12 (2010.01); H01L 33/22 (2010.01); H01L 21/02 (2006.01); H01L 33/00 (2010.01); H01L 31/0304 (2006.01); H01L 33/32 (2010.01);
U.S. Cl.
CPC ...
H01L 31/1852 (2013.01); H01L 21/0243 (2013.01); H01L 21/0254 (2013.01); H01L 21/02458 (2013.01); H01L 21/02639 (2013.01); H01L 21/02647 (2013.01); H01L 31/03044 (2013.01); H01L 31/1856 (2013.01); H01L 33/007 (2013.01); H01L 33/0066 (2013.01); H01L 33/0075 (2013.01); H01L 33/12 (2013.01); H01L 33/22 (2013.01); H01L 33/32 (2013.01); H01L 21/02488 (2013.01); H01L 2933/0033 (2013.01);
Abstract

In an embodiment a method includes providing a growth substrate comprising a growth surface formed by a planar region having a plurality of three-dimensional surface structures on the planar region, directly applying a nucleation layer of oxygen-containing AlN to the growth surface and growing a nitride-based semiconductor layer sequence on the nucleation layer, wherein growing the semiconductor layer sequence includes selectively growing the semiconductor layer sequence upwards from the planar region such that a growth of the semiconductor layer sequence on surfaces of the three-dimensional surface structures is reduced or non-existent compared to a growth on the planar region, wherein the nucleation layer is applied onto both the planar region and the three-dimensional surface structures of the growth surface, and wherein a selectivity of the growth of the semiconductor layer sequence on the planar region is targetedly adjusted by an oxygen content of the nucleation layer.


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