The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Aug. 28, 2020
Applicant:

Openlight Photonics, Inc., Goleta, CA (US);

Inventors:

Erik Johan Norberg, Santa Barbara, CA (US);

Rui Liang, Santa Clara, CA (US);

Benjamin M. Curtin, Santa Barbara, CA (US);

Jared Bauters, Santa Barbara, CA (US);

Assignee:

OpenLight Photonics, Inc., Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/45 (2006.01); G02B 6/13 (2006.01); G02F 1/225 (2006.01); G02F 1/21 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9505 (2013.01); G01N 21/45 (2013.01); G02B 6/13 (2013.01); G02F 1/225 (2013.01); G01N 2201/06113 (2013.01); G01N 2201/08 (2013.01); G02F 1/212 (2021.01);
Abstract

Optical fabrication monitor structures can be included in a design fabricated on a wafer from a mask or fabrication reticle. A first set of components can be formed in an initial fabrication cycle, where the first set includes functional components and monitor structures. A second set of components can be formed by subsequent fabrication processes that can potentially cause errors or damage to the first set of components. The monitor structures can be implemented during fabrication (e.g., in a cleanroom) to detect fabrication errors without pulling or scrapping the wafer.


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