The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2022
Filed:
Mar. 27, 2019
Applicant:
Tyler A. Lowrey, Hamilton, MT (US);
Inventor:
Tyler A. Lowrey, Hamilton, MT (US);
Assignee:
Innoven Energy LLC, Colorado Springs, CO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/50 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/542 (2013.01); C23C 14/34 (2013.01); C23C 14/505 (2013.01);
Abstract
A system and method for controllably varying the thickness of film deposition on a spherical or other non-flat substrate during high volume manufacturing is described. A gripping X-Y transfer stage rotates a substrate in-situ in a direction film deposition chamber. The transfer stage is driven at variable speeds to realize a desired distribution of film thickness variation around the surface of the substrate. Spatial variations in disposition thickness can be smoothly and continuously variable or abruptly changed.