The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Dec. 12, 2017
Applicant:

Dic Corporation, Tokyo, JP;

Inventors:

Hirohide Nakaguma, Sakura, JP;

Ayako Isshiki, Sakura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 5/00 (2006.01); C08F 293/00 (2006.01); C12M 1/12 (2006.01);
U.S. Cl.
CPC ...
C12N 5/0068 (2013.01); C08F 293/005 (2013.01); C12M 25/14 (2013.01); C12N 2533/30 (2013.01);
Abstract

The present invention is to provide a cell culture substrate including a block polymer including a segment having a lower critical solution temperature and a hydrophobic segment, in which the segment having a lower critical solution temperature has a degree of polymerization of 400 to 10,000. Also provided is a cell culture substrate, in which the hydrophobic segment is obtainable by polymerizing a monomer having a particular structure. Also provided is a cell culture substrate being laminated on a supporting medium. Furthermore, a cell culture substrate having an average film thickness of 1,000 nm or less is provided.


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