The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Mar. 23, 2018
Applicant:

Micralyne Inc., Edmonton, CA;

Inventor:

Glen Fitzpatrick, Edmonton, CA;

Assignee:

Teledyne Micralyne, Inc., Thousand Oaks, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09J 1/00 (2006.01); G02B 1/14 (2015.01); C01B 21/082 (2006.01); C23C 16/50 (2006.01); C23C 16/30 (2006.01); B81B 3/00 (2006.01);
U.S. Cl.
CPC ...
C09J 1/00 (2013.01); C01B 21/0823 (2013.01); C23C 16/308 (2013.01); C23C 16/50 (2013.01); G02B 1/14 (2015.01); B81B 3/0089 (2013.01); B81B 2201/0214 (2013.01); B81B 2203/04 (2013.01);
Abstract

The invention relates generally to use of a silicon oxynitride film which exhibits desirable physical and chemical properties; superiority in adhesion to metals including noble metals and other metals, transparent conductive oxides, and semiconductor materials compared to silicon dioxide and silicon nitride; is wet-etchable, dry-etchable, or both; and operates as a high-performance overcoat barrier dielectric. The silicon oxynitride film meets performance requirements via a process that does not require an adhesion layer for deposition, and does not contaminate, obscure, or damage the device through incorporation or processing of additional adhesion layers.


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