The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Oct. 25, 2018
Applicants:

Board of Regents, the University of Texas System, Austin, TX (US);

Adaptive 3d Technologies, Dallas, TX (US);

Inventors:

Gregory T. Ellson, Dallas, TX (US);

Benjamin R. Lund, Wylie, TX (US);

Walter Voit, Dallas, TX (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/101 (2014.01); C09D 11/102 (2014.01); C09D 11/033 (2014.01); C08G 18/38 (2006.01); C08G 18/08 (2006.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B29C 64/124 (2017.01); C08G 18/73 (2006.01); C08G 18/76 (2006.01); C08G 18/72 (2006.01); C08G 18/75 (2006.01); C08G 18/79 (2006.01); C08G 18/20 (2006.01); B29K 75/00 (2006.01);
U.S. Cl.
CPC ...
C09D 11/101 (2013.01); B29C 64/124 (2017.08); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); C08G 18/089 (2013.01); C08G 18/2063 (2013.01); C08G 18/3876 (2013.01); C08G 18/725 (2013.01); C08G 18/73 (2013.01); C08G 18/752 (2013.01); C08G 18/755 (2013.01); C08G 18/758 (2013.01); C08G 18/7614 (2013.01); C08G 18/7621 (2013.01); C08G 18/7642 (2013.01); C08G 18/7671 (2013.01); C08G 18/792 (2013.01); C09D 11/033 (2013.01); C09D 11/102 (2013.01); B29K 2075/00 (2013.01);
Abstract

A vat resin for three-dimensional stereolithography printing of a thiourethane polymer part comprising a liquid mixture including a first type of monomer, a second type of monomer, a photolatent base decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7, an anionic step-growth polymerization reaction inhibitor having an acidic group configured to form an acid-base pair with the non-nucleophillic base and a light absorber having an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure. Methods of preparing the vat resin and three-dimensional stereolithography printing a thiourethane polymer part using the vat resin are also disclosed.


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