The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2022
Filed:
Jun. 20, 2018
Applicant:
Ares Materials Inc., Dallas, TX (US);
Inventors:
Radu Reit, Carrollton, TX (US);
Adrian Avendano-Bolivar, Plano, TX (US);
Apostolos Voutsas, Portland, OR (US);
David Arreaga-Salas, Garland, TX (US);
Assignee:
Ares Materials, Inc., Dallas, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 75/045 (2016.01); H01L 21/768 (2006.01); G03F 7/038 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
C08G 75/045 (2013.01); H01L 21/76802 (2013.01); G03F 7/038 (2013.01); G03F 7/094 (2013.01);
Abstract
Provided is a method for forming an organic planarization layer. The method includes forming lithographically-patterned arrays atop a substrate; disposing a thiol-based photocurable resin on to the lithographically-patterned arrays to form a photocurable planarization layer; and curing the photocurable planarization layer to form a flat surface above the lithographically-patterned array.