The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Jan. 22, 2019
Applicant:

Concept Laser Gmbh, Lichtenfels, DE;

Inventors:

Tim Klaußner, Kronach, DE;

Tobias Bokkes, Untersiemau, DE;

Martin Wachter, Weißenbrunn, DE;

Fabian Zeulner, Lichtenfels, DE;

Marie-Christin Ebert, Coburg, DE;

Assignee:

CONCEPT LASER GMBH, Lichtenfels, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); B33Y 50/02 (2015.01); B29C 64/277 (2017.01); B29C 64/268 (2017.01); B22F 10/30 (2021.01); B33Y 30/00 (2015.01); B29C 64/153 (2017.01); B22F 10/20 (2021.01); B29C 64/135 (2017.01); B29C 64/165 (2017.01); G06F 30/00 (2020.01); B33Y 10/00 (2015.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B22F 10/20 (2021.01); B29C 64/135 (2017.08); B29C 64/153 (2017.08); B29C 64/165 (2017.08); B29C 64/268 (2017.08); B29C 64/277 (2017.08); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); G06F 30/00 (2020.01); B22F 10/30 (2021.01); B33Y 10/00 (2014.12); G06F 2119/18 (2020.01);
Abstract

Method for calibrating at least one apparatus () for additively manufacturing three-dimensional objects by means of successive layerwise selective irradiation and consolidation of layers of a build material which can be consolidated by means of an energy beam that can be generated via an irradiation element of an irradiation device () of the apparatus (), wherein a determination unit () is provided for determining at least one parameter of radiation () inside a process chamber (), wherein a calibration beam source () is arranged or generated inside the process chamber () of the apparatus (), in particular in a build plane () or a region above the build plane (), wherein at least one parameter, in particular the intensity, of radiation () emitted by the calibration beam source () is determined via the determination unit ().


Find Patent Forward Citations

Loading…