The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2022
Filed:
May. 15, 2019
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Naoki Murasato, Utsunomiya, JP;
Ken Minoda, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/56 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01); B29C 59/02 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
B29C 43/56 (2013.01); B29C 59/02 (2013.01); G03F 7/0002 (2013.01); G03F 7/002 (2013.01); G03F 9/00 (2013.01); H01L 21/027 (2013.01); B29C 2043/566 (2013.01);
Abstract
An imprint apparatus cures an imprint material by irradiating the imprint material with light while the imprint material on a substrate is in contact with a pattern region of a mold. The imprint apparatus includes a first supply unit configured to supply a first gas to a gap between the substrate and the mold, the first gas accelerating filling of recessed portions of the pattern region with the imprint material, and a second supply unit configured to supply a second gas to the gap, the second gas inhibiting curing of the imprint material.