The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Apr. 30, 2020
Applicant:

Ichor Systems, Inc., Fremont, CA (US);

Inventors:

Sean Penley, Sparks, NV (US);

Michael Maeder, Reno, NV (US);

Daniel T. Mudd, Reno, NV (US);

Patti J. Mudd, Reno, NV (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 31/02 (2006.01); H01L 21/67 (2006.01); B05B 12/08 (2006.01); B05B 1/30 (2006.01); F16K 1/00 (2006.01); G05D 7/06 (2006.01); F16K 27/02 (2006.01); F16K 37/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); B05B 1/3013 (2013.01); B05B 12/087 (2013.01); F16K 1/00 (2013.01); F16K 27/029 (2013.01); F16K 37/005 (2013.01); G05D 7/0647 (2013.01); H01L 21/67017 (2013.01);
Abstract

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a gas flow control system for achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to an apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-pressurize a P1 volume so that the response time of the apparatus is no longer dependent on the speed of the apparatus's control valves and the limitations of the control loop.


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