The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Apr. 20, 2021
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventors:

Kazuki Kamimura, Matsumoto, JP;

Motoyoshi Kubouchi, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 21/22 (2006.01); H01L 27/06 (2006.01); H01L 29/10 (2006.01); H01L 29/32 (2006.01); H01L 21/8222 (2006.01); H01L 29/861 (2006.01); H01L 21/265 (2006.01); H01L 21/268 (2006.01);
U.S. Cl.
CPC ...
H01L 21/221 (2013.01); H01L 21/268 (2013.01); H01L 21/26513 (2013.01); H01L 21/8222 (2013.01); H01L 27/0664 (2013.01); H01L 29/0623 (2013.01); H01L 29/1095 (2013.01); H01L 29/32 (2013.01); H01L 29/66136 (2013.01); H01L 29/66348 (2013.01); H01L 29/7397 (2013.01); H01L 29/8613 (2013.01);
Abstract

A semiconductor device has transistor portions and diode portions. The transistor portions have a semiconductor substrate of a first conductivity type, a first semiconductor region of a second conductivity type, second semiconductor regions of the first conductivity type, gate insulating films, gate electrodes, a first semiconductor layer of the first conductivity type, a third semiconductor region of the second conductivity type, a first electrode, and a second electrode. The diode portions have the semiconductor substrate, the first semiconductor region, the first semiconductor layer, a fourth semiconductor region of the first conductivity type, the first electrode, and the second electrode. A first depth of the first semiconductor layer from the back surface of the semiconductor substrate in the transistor portions is greater than a second depth of the first semiconductor layer from the back surface of the semiconductor substrate in the diode portions.


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