The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Oct. 19, 2018
Applicant:

Georgia Tech Research Corporation, Atlanta, GA (US);

Inventors:

Lukas Graber, Atlanta, GA (US);

Tushar Damle, Atlanta, GA (US);

Gyu Cheol Lim, Atlanta, GA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01H 1/06 (2006.01); G01R 31/327 (2006.01); H01H 1/14 (2006.01); H01H 1/58 (2006.01); H01H 9/54 (2006.01); H01H 57/00 (2006.01); H01H 11/04 (2006.01);
U.S. Cl.
CPC ...
H01H 1/06 (2013.01); G01R 31/3277 (2013.01); H01H 1/14 (2013.01); H01H 1/58 (2013.01); H01H 9/548 (2013.01); H01H 11/04 (2013.01); H01H 57/00 (2013.01);
Abstract

Systems, devices, and methods disclosed herein can generally include electrical contacts for high voltage, high current, and/or fast acting electromechanical switches and methods for manufacturing the same. The electrical contacts can be optimized for high voltage blocking capabilities with minimal gap spacing in the open state and low electrical resistance when in contact in the closed state. Electrical contacts can have a geometry to produce a low peak electric field between the contacts when in the open state, have a high contact surface area when in the closed state, and a low mass. The geometry of the contacts can be based on geometries traditionally utilized for uniform field electrodes.


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