The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Jan. 27, 2020
Applicant:
Hitachi Metals, Ltd., Tokyo, JP;
Inventor:
Noriyuki Nozawa, Minato-ku, JP;
Assignee:
HITACHI METALS, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 1/057 (2006.01); C22C 38/02 (2006.01); C22C 38/00 (2006.01); C22C 38/04 (2006.01); C22C 38/06 (2006.01); C22C 38/10 (2006.01); C22C 38/16 (2006.01); H01F 41/02 (2006.01);
U.S. Cl.
CPC ...
H01F 1/0577 (2013.01); C22C 38/002 (2013.01); C22C 38/005 (2013.01); C22C 38/02 (2013.01); C22C 38/04 (2013.01); C22C 38/06 (2013.01); C22C 38/10 (2013.01); C22C 38/16 (2013.01); H01F 41/0293 (2013.01); C22C 2202/02 (2013.01);
Abstract
A method for producing a sintered R-T-B based magnet includes: a step of providing a sintered R-T-B based magnet work; a step of providing an RL-RH-M based alloy; and a diffusion step. In the diffusion step, an adhering amount of the RL-RH-M based alloy to the magnet work is 4 to 15 mass %, and an adhering amount of RH is 0.1 to 0.6 mass %; in the magnet work, the R content accounts for 27 to 35 mass %, the Fe content in the entire T accounting for 80 mass % or more; and, in the RL-RH-M based alloy, the RL content accounts for 60 to 97 mass %; the RH content accounting for 1 to 8 mass %; and the M content accounts for 2 to 39 mass %.