The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
May. 02, 2018
Applicant:
Heptagon Micro Optics Pte. Ltd., Singapore, SG;
Inventors:
Qichuan Yu, Singapore, SG;
Han Nee Ng, Singapore, SG;
Tobias Senn, Singapore, SG;
John A. Vidallon, Singapore, SG;
Ramon Opeda, Jr., Singapore, SG;
Attilio Ferrari, Rüschlikon, CH;
Hartmut Rudmann, Rüschlikon, CH;
Martin Schubert, Rüschlikon, CH;
Assignee:
Heptagon Micro Optics Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); B29D 11/00 (2006.01); G03F 7/00 (2006.01); B29C 43/36 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0031 (2013.01); B29C 43/36 (2013.01); B29D 11/00 (2013.01); G03F 7/0002 (2013.01); B29D 11/00298 (2013.01); B29D 11/00365 (2013.01); G03F 7/0015 (2013.01);
Abstract
The method for manufacturing a multitude of devices comprises: And it further comprises, after the conditioning: The treatment can comprise dimensionally changing the tool material by the exposure of the tool material to the conditioning material. Before carrying out the replication processes, the conditioning material can be hardened and removed.